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In addition to various growth
systems, we have a growing range of fabrication tools on campus at our
disposal.
E-beam Nanolithography
We use a Jeol JSM-IC848a microscope equipped with the Nanometer Pattern
Generation System (NPGS) for nanoscale lithography. This 40 kV
thermionic emission microscope has a quoted 4 nm imaging resolution and we
have demonstrated <10 nm performance in its current location in our
laboratory. Though the microscope is a useful tool for investigation
and characterization of our devices, the main use is for e-beam lithography
via computer control of the electron probe. A second SEM, an FEI Sirion 400
with a field-emission source is waiting to be commissioned to add to our
capabilities.
We have recently acquired a
second microscope, an FEI Sirion 400 with a field-emission source, that will
be installed soon to extend our capabilities.
Our lab also houses supporting equipment including spinners, hot-plates and
ovens for preparation of PMMA and PMGI resist layers.
COMING SOON: DU Nanoscale Physics Fabrication Facility (working
title)
In collaboration with the Fan and Siemens groups, we are currently planning
installation of 200+ sq. ft. of class 1000 clean space including modern
plasma etching, photolithography, and wet chemistry facilities.
Details to follow soon...
Off-campus facilities:
Zink group members continue to enjoy use of the DOE Center for Integrated
Nanotechnologies and other nearby fabrication facilities as needed.