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In addition to various growth
systems, we have a growing range of fabrication tools on campus at our
We use a Jeol JSM-IC848a microscope equipped with the Nanometer Pattern
Generation System (NPGS) for nanoscale lithography. This 40 kV
thermionic emission microscope has a quoted 4 nm imaging resolution and we
have demonstrated <10 nm performance in its current location in our
laboratory. Though the microscope is a useful tool for investigation
and characterization of our devices, the main use is for e-beam lithography
via computer control of the electron probe. A second SEM, an FEI Sirion 400
with a field-emission source is waiting to be commissioned to add to our
We have recently acquired a
second microscope, an FEI Sirion 400 with a field-emission source, that will
be installed soon to extend our capabilities.
Our lab also houses supporting equipment including spinners, hot-plates and
ovens for preparation of PMMA and PMGI resist layers.
COMING SOON: DU Nanoscale Physics Fabrication Facility (working
In collaboration with the Fan and Siemens groups, we are currently planning
installation of 200+ sq. ft. of class 1000 clean space including modern
plasma etching, photolithography, and wet chemistry facilities.
Details to follow soon...
Zink group members continue to enjoy use of the DOE Center for Integrated
Nanotechnologies and other nearby fabrication facilities as needed.